Semiconductor

Endless Exploration, Boundless Opportunities

Ultrapure Gas Filter GIST Mega

  •  

    GIST Mega in-line ultra-pure gas filter is specially designed for high-flow electronic grade gas, and filtration accuracy can reach 1.5 nm. The device is compact, excellent strength and compatible for most of semiconductor process gases. lt is suitable for bulk gases and inert gases.

     

    Product Features

    •  316L electronic grade hardware

    •  High throughput and low pressure drop

    •  Excellent chemical compatibility

    •  Suitable for high temperature and high pressure environment

    •  100% integrity tested

    •  100% helium leak tested

    •  Manufactured in a dust-free environment

     

    Technical Parameter

    • Membrane‌: PTFE
    • Cage‌: PP
    • O-ring‌: EPDM
    • Shell‌: Solution I: LS 316L; Solution II: SS 316L(VAR/VIM+VAR)
    • Surface Treatment‌: Outer surface: Ra<1.6μm; Inner surface: Ra<0.6μm
    • Filtration Rating‌: ≥1.5nm
    • Filtration Efficiency‌: ≥99.9999999% (9 LRV)@300 slpm (MPPS, all particles)
    • Helium Leak Test‌: Qualified: 2×10⁻¹⁰ atm.cc/sec; Tested: 1×10⁹ atm.cc/sec
    • Max. forward flow D.P.‌: 4.1 bar @ 23℃
    • Max. reverse flow D.P.‌: 0.7bar@23℃
    • Max. Operation Temperature‌: 60℃
    • Flow rate‌: N model: 0~1500slpm; L model: 0~3000slpm
Ultrapure Gas Filter GIST Mega
+
  • Ultrapure Gas Filter GIST Mega

Product Parameters

  • Maximum inlet pressure:12bar(174 psig)@ 23℃(73℉)

    Maximum forward differential pressure:4.1bar(59 PSID) @ 23℃(73℉)

    Maximum reverse differential pressure:0.07mpa (0.7 bar, 10 PSID) @ 23℃(73℉)

    Maximum operating temperature:60℃(140 ℉)

    Gas flow rate (operating flow range):

    N: 0-1500slpm

    L: 0-3000slpm

Related components

Related Equipment

Message consultation


+86
  • +86 CN
Submit
%{tishi_zhanwei}%