FTKLN A Inert Gas Purifier

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The Feature Clean series is designed for the gas purification needs of POU end customers. The A series primarily aims to enhance the consistency and ultimate purity of high-purity inert gases used in the microelectronics industry. It employs a scientific material ratio to deeply remove impurities such as water, oxygen, carbon monoxide, and carbon dioxide from the inert gas, ensuring the gas purity at the final usage point.

Product Features

• Process Control: Purity control below ppb levels, with purifiers manufactured under ISO9001:2015 standards and CE Pressure Equipment Directive (PED) certification.

• Ease of Operation and Installation: No need for heaters or other power-consuming devices; operates at room temperature. Vertical installation is recommended, with gas flow direction from top to bottom.

• Cost Savings: Shell life of 20 years. Can operate for one year with inlet gas water and oxygen content at 1 ppm. Can be returned for regeneration after adsorption saturation.

Typical Application

• Semiconductor industry

• Cylinder gas purification

• Chromatographic carrier gas purification

• Other fields

Product Parameters

Maximum inlet pressure:207 Bar@23℃
Maximum differential pressure:
Forward: 4 bar (60 psid) @ 23°C (73 °F)
反向: 0.07 MPa (0.7 bar, 10 psid) @ 23°C (73℉)
Maximum operating temperature:120 ℃ (248 ℉)
Gas flow rate:
Recommended working flow rate: 0-60slpm

Typical Applications

Semiconductor Filtration

Ultrapure Gas Filtration

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