Filtration & Separation Solutions

Embrace Ultimate Application Challenges of Filtration, Separation, and Purification Technology

Wafer Cleaning & Filtration

Currently, the most advanced chip manufacturing processes involve nearly 4,000 steps. These processes can be divided into two main stages: wafer manufacturing (Front End of the Line) and package testing (Back End of the Line). In the wafer manufacturing stage, the goal is to produce integrated circuits on silicon wafers. The end product from the factory is a fully processed round wafer. The manufacturing process includes lithography, etching, thin film deposition, ion implantation, heat treatment, cleaning, CMP (Chemical Mechanical Polishing), and measurement, among others.

 

Due to the extremely high precision required for wafer fabrication, even tiny contaminants that are not visible to the naked eye can have a significant impact on a chip. They can easily cause damage to the functionality of circuits within the wafer, leading to integrated circuit failures and affecting the formation of geometric features.

 

Wafer Surface Contaminants

- Particles: Polymers, photoresists, etching impurities, etc.

- Organics: Organic contamination exists in many forms, such as human skin oils, clean room air, mechanical oils, cleaning solvents, etc.

- Metals: metal contamination from the production process of photolithography, etching, chemical vapor deposition, chemical mechanical polishing and other processes

- Oxide: Silicon atoms readily undergo oxidation when exposed to environments containing both oxygen and water, resulting in the formation of an oxide layer. After the cleaning process involving SC-1 and SC-2 solutions, the silicon wafers undergo chemical oxidation on their surfaces due to the potent oxidizing properties of hydrogen peroxide.

 

Before and after each process, silicon wafers must be cleaned to remove the contamination of the previous process and create conditions for the next process.

 

After the wafer has been cleaned, the pollutants on the surface migrate to the cleaning fluid. The purpose of cleaning fluid filtration is to remove these pollutants and meet the standards for cleaning recycling or disposal. If the filter material is corroded by the chemical liquid, it may lead to a decrease in filter material performance or the introduction of new pollutants.

 

When filtering acid and alkali chemical fluids, it's essential to consider both impurity filtration needs and the compatibility between the chemical fluids and filter materials. Therefore, it is crucial to select filter materials that are resistant to corrosion from acids and alkalis.

 

Feature-Tec Solutions

 

Mighty - Perfluoro High Efficiency Cartridges

The Mighty cartridge adopts an advanced Perfluoro structure, offering excellent chemical compatibility and an extremely low precipitation level. It is suitable for the filtration and purification of critical wet electronic chemicals. Mighty cartridge boasts remarkable retention efficiency and incorporates a unique folding technology to ensure high throughput, low resistance, and a prolonged service life for the cartridge.

 

Taurus - High Flux PTFE Cartridge

The Taurus series cartridge utilizes PTFE filter membrane, boasting excellent chemical compatibility. It is suitable for the filtration and purification of diluted acids, alkalis, solvents, deionized water, and more. With its unique folding technology, it ensures both high retention efficiency and guarantees high throughput and low resistance for extended product service life. The Taurus series cartridge offers a choice between hydrophilic and hydrophobic membranes, eliminating the need for pre-wetting and saving startup time, thus reducing operational costs.

 

Libra - Perfluoro Hydrophilic PTFE Cartridges

The Libra cartridge utilizes an advanced perfluorine structure, offering excellent chemical compatibility and an extremely low precipitation level. It is suitable for the filtration and purification of critical wet electronic chemicals. Libra incorporates a modified PTFE filter membrane, eliminating the need for pre-wetting, which saves startup time and reduces operational costs.

 

PEASIC Cartridge

PEASIC cartridges are crafted from highly asymmetric polyethersulfone membranes, renowned for their high flux, low resistance, and exceptional dirt-holding capacity. This makes them an excellent choice for filtering dilute acids, alkalis, and deionized water in the microelectronics industry. The inherent hydrophilicity of polyethersulfone eliminates the requirement for pre-wetting treatment, resulting in reduced cartridge replacement time and enhanced equipment uptime.

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