Feature-Tec Launch: Advanced Dual-Filtration for Semiconductors

2025-12-19

 

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As 2025 draws to a close, semiconductor and high-end manufacturing processes continue to evolve toward high cleanliness, high stability, and high efficiency. Against this backdrop, filtration systems have become a critical link in ensuring process safety and yield. Feature-Tec has officially launched the GRAND High-Flow Filter Cartridge and the LNF High-Precision Deep-Wound Filter Cartridge. Featuring differentiated structural designs and rigorous material selection, these products form a dual filtration solution spanning from high-flow delivery to fine deep retention.

 

High-Flow Filter Cartridge GRAND | Engineered for Critical Wet Processes

The GRAND series utilizes hydrophobic UPE filter media and an all-HDPE structural design. While achieving high throughput and low pressure drop, it effectively controls extractable levels and particle risks, meeting the stringent fluid stability requirements of semiconductor cleaning and wet etching processes. Its high dirt-holding capacity and optimized internal flow channels improve system efficiency and reduce maintenance frequency, providing reliable support for continuous equipment operation. It is particularly suited for high-purity fluid filtration scenarios such as photochemical solvents, cleaning solutions, and etching chemicals.

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Product Features

  • High Flow & Low-Pressure Drop: Optimized for efficient fluid delivery.
  • Low Surface Tension: Compatible with specialized chemical profiles.
  • Low Extractable Levels: Minimizes chemical contamination risks.
  • Stringent Cleanliness Control: Ensures high-purity process integrity.

Technical Specifications

  • Filter Media: Hydrophobic UPE (Ultra-High Molecular Weight Polyethylene).
  • Core & End Caps: HDPE (High-Density Polyethylene).
  • Support & Drainage Layers: HDPE.
  • Max. Operating Temperature: 60°C.
  • Max. Forward Differential Pressure: 3.4 bar @ 25°C (49 psi @ 77°F).
  • Max. Reverse Differential Pressure: 2.4 bar @ 25°C (34 psi @ 77°F).

 

High-Precision Deep-Wound Filter Cartridge LNF | Performance That Lasts

The LNF series employs a multi-layer gradient structure and polypropylene deep-winding technology to achieve progressive interception from the outside in. Compared to traditional melt-blown cartridges, it offers higher porosity, larger dirt-holding capacity, and a longer service life, significantly reducing pressure drop fluctuations and replacement frequency. The integrated all-polypropylene construction contains no binders or surfactants, ensuring excellent chemical compatibility and stability in Slurry delivery and Central Delivery Systems (CDS).

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Product Features

  • Polypropylene Material: Uniform pore size with higher porosity than standard melt-blown filters, resulting in a low initial pressure drop.
  • Multi-layer Gradient Structure: Enables stage-by-stage filtration, extending service life to 2–3 times that of ordinary melt-blown filters.
  • All-Polypropylene Construction: Provides superior chemical compatibility.
  • Zero Chemical Leaching: Manufactured without binders or surfactants to ensure no compound migration during use.

Technical Specifications

  • Filter Media: Polypropylene.
  • Core & End Caps: Polypropylene.
  • Outer Diameter: 2.48" (63 mm).
  • Inner Diameter: 1.1" (28 mm).
  • Max. Operating Temperature: 80°C.
  • Max. Operating Differential Pressure: 3.43 bar @ 30°C (49.8 psi @ 86°F).
  • Recommended Replacement ΔP: 2 bar @ 30°C (29 psi @ 86°F).

Dual New Products | One Consistent Commitment

At Feature-Tec, material is our foundation and technology is our soul, ensuring that high-purity manufacturing remains reliable even in the most "invisible" details. As advanced semiconductor nodes continue to shrink and process windows tighten, filtration systems have evolved from "auxiliary components" to core units for process stability and yield control.

With over 20 years of expertise in filtration and separation, Feature-Tec leverages its mastery of material systems, structural design, and cleanliness management to provide highly reliable solutions for cleaning, wet etching, slurry delivery, and facility distribution systems. The GRAND and LNF series represent more than just product updates; they are the culmination of years of technical accumulation and an extension of our systematic capabilities.

 

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About Feature-Tec

Feature-Tec has focused on filtration, separation, and purification for over 20 years, integrating R&D, design, manufacturing, and testing. We operate two global production bases and six offices. Our Filtration Performance Testing & Validation Center is CNAS accredited and complies with ISO 17025 and GMP-like quality systems.

Our solutions serve diverse sectors, including semiconductors, FPD, biopharmaceuticals, nuclear power, lithium batteries, automotive, and more. From automatic filtration systems to specialized catalyst recovery and nano-slurry concentration, Feature-Tec helps customers achieve high-precision customization and green production.


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