Semiconductor
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High purity porous metal restrictor Flores
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Flow limiting devices are typically installed in compressed gas supply pipelines and gas
distribution manifolds to prevent accidental high gas flow caused by gas pipeline rupture, valve
failure, or pressure regulator malfunction.
In extreme situations, they ensure the safety of semiconductor personnel, maintain equipment
stability, and reduce product loss.
Compared to traditional single-orifice flow restrictors, the sintered metal powder core features a
porous structure, ensuring smooth laminar flow even at high flow rates.
The unique porous structure also avoids the wear and tear associated with single-orifice flow
restrictors, reducing the need for frequent recalibration, minimizing blockage from small
particles, and extending service life.
Product Features
- Compact structure, easy installation
- Standardized VCR fitting design, suitable for pipeline installation
- Fully 316L construction, compatible with various process gases
- High structural strength, suitable for high-pressure gas applications
- Unique porous structure for more stable gas laminar flow
- Less affected by particles, lower wear impact, longer service life
- 100% Helium leak detection test
- 100% calibrated flow curve before delivery
- Stable structure, no bonding, no particle shedding
- Produced in a Class 100 cleanroom, high cleanliness, ready to use
Technical Parameters
- Membrance: 316L SS powder sintered filte
- Housing: Low sulfur 316L SS
- Flow rate: 0.1sccm~40slpm
- Max. inlet pressure: 1500psig
- Filtration accuracy: ±7.5% Base
- Repeatability: ±0.1%
- Max. operating temp.: 460℃
- Helium Leak Test: 1x10⁹atm.cc/sec。
Product Parameters
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Maximum inlet pressure:207 Bar@23℃
Maximum differential pressure:
Forward: 4 bar (60 psid) @ 23°C (73 °F)
反向: 0.07 MPa (0.7 bar, 10 psid) @ 23°C (73℉)
Maximum operating temperature:120 ℃ (248 ℉)
Gas flow rate:
Recommended working flow rate: 0-60slpm
Typical Applications
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Contact
Hotline: (+86)400-820-6150
Email: marketing@feature-tec.com
Address: 8/F, Block A, Building 3, Tianhua Information Technology Park, 299 Longcao Road, Xuhui District, Shanghai
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