High-Flow Filter Cartridge GRAND

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Designed to supply critical fluids for semiconductor cleaning and wet etching processes, including photochemical solvents, cleaning solutions, and etchants. It improves equipment efficiency,

reduces maintenance requirements, and maximizes system uptime to meet the demands of

advanced semiconductor manufacturing.

‌Product Features‌
- High flow rate with low pressure drop
- Low surface tension
- Low extractables level
- High-level cleanliness control
‌Typical Application‌
- Photochemical solvents
- Cleaning solutions
- Etchants
‌

Technical Parameter‌
- ‌Membrane‌: UPE
- ‌Cage and End cap‌: HDPE
- ‌Stand and water distribution layer‌: HDPE
- ‌Max. Operation Temperature‌: 60℃
- ‌Max. forward flow D.P.‌: 3.4bar @25℃ (49psi@77℉)
- ‌Max. reverse flow D.P.‌: 2.4bar @25℃(34psi@77℉)

Product Parameters

Typical Applications

Related components

Related Equipment

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