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Ultra-High Purity Gas Filter‌ Gasfil ALO

  • The Gasfil ALO series ultra-high purity gas filters utilize high-purity porous aluminum oxide ceramic

    elements, achieving filtration ratings down to 1.5 nm. Specifically designed for online filtration of

    ultra-high purity process gases in semiconductor manufacturing, the series offers flow capacities

    ranging from 30 to 3000 L/min and is particularly suitable for applications requiring compact size

    with high flow rate.

     

    Product Features

    • 316L stainless steel housing; Ultra-high particle removal efficiency;
    • Compact size, high throughput, and low flow resistance;
    • Compatible with a wide range of process gases, including strongly oxidizing gases;
    • Manufactured, tested, and packaged in a cleanroom environment;
    • 100% integrity testing; 100% helium leak testing.

    Technical Parameter

    • Membrane‌: Inert Alumina
    • Shell‌: Low sulfur 316L SS; Ultra pure 316L (VAR/VIM+VAR)
    • Surface Treatment‌: Outer surface: Ra<1.6μm; Inner surface: Electropolishing, Ra<0.2μm
    • Filtration Rating‌: ≥1.5nm
    • Filtration Efficiency‌: ≥99.9999999% (9 LRV) @ 30 slpm
    • Max. operating temp.‌: 50℃
    • Particle shedding‌: <1 particle/ft³ @ >0.01μm, 30slpm
    • Helium Leak Test‌: Qualified: 2×10⁻¹⁰ atm.cc/sec; Tested: 1×10⁻⁹ atm.cc/sec
    • Max. inlet pressure‌: 207 bar
    • Max. operating D.P.‌: 5.2 bar
Ultra-High Purity Gas Filter‌ Gasfil ALO
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  • Ultra-High Purity Gas Filter‌ Gasfil ALO

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