Semiconductor
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Ultra-High Purity Gas Filter Gasfil ALO
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The Gasfil ALO series ultra-high purity gas filters utilize high-purity porous aluminum oxide ceramic
elements, achieving filtration ratings down to 1.5 nm. Specifically designed for online filtration of
ultra-high purity process gases in semiconductor manufacturing, the series offers flow capacities
ranging from 30 to 3000 L/min and is particularly suitable for applications requiring compact size
with high flow rate.
Product Features
- 316L stainless steel housing; Ultra-high particle removal efficiency;
- Compact size, high throughput, and low flow resistance;
- Compatible with a wide range of process gases, including strongly oxidizing gases;
- Manufactured, tested, and packaged in a cleanroom environment;
- 100% integrity testing; 100% helium leak testing.
Technical Parameter
- Membrane: Inert Alumina
- Shell: Low sulfur 316L SS; Ultra pure 316L (VAR/VIM+VAR)
- Surface Treatment: Outer surface: Ra<1.6μm; Inner surface: Electropolishing, Ra<0.2μm
- Filtration Rating: ≥1.5nm
- Filtration Efficiency: ≥99.9999999% (9 LRV) @ 30 slpm
- Max. operating temp.: 50℃
- Particle shedding: <1 particle/ft³ @ >0.01μm, 30slpm
- Helium Leak Test: Qualified: 2×10⁻¹⁰ atm.cc/sec; Tested: 1×10⁻⁹ atm.cc/sec
- Max. inlet pressure: 207 bar
- Max. operating D.P.: 5.2 bar
Product Parameters
Typical Applications
Related components
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Contact
Hotline: (+86)400-820-6150
Email: marketing@feature-tec.com
Address: 8/F, Block A, Building 3, Tianhua Information Technology Park, 299 Longcao Road, Xuhui District, Shanghai
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