Photochemical Filter Polyflora E/F

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Polyflora E series photochemical filters feature a straight-type interface arrangement, while the F series features a triangular interface arrangement. Both types can be quickly assembled and disassembled with pipe fittings, suitable for deionized water, developer, photoresist, and other photochemical reagents, offering a wide range of applications.

Product Features

• Chemical compatibility: Developers, photoresists, and other photochemical reagents

• Low elution: Control of low elution of metal ions, organic substances, and non-volatile residues

• Ultra-clean process: Enhanced cleaning technology reduces particle shedding and microbubble formation

• Flexible adaptation: Multiple membrane materials (UPE, Nylon, PTFE) and retention accuracies (3 nm to 200 nm) available

Typical Application

• EUV, ArF, KrF photoresist

• Developer

• Solvents

‌Technical Parameter‌
- ‌Membrane‌: UPE、Nylon、PTFE
- ‌Cage and End cap‌: HDPE
- ‌Stand and water distribution layer‌: HDPE
- ‌O-rings‌: FFKM
- ‌Max. Operation Temperature‌: 40℃
- ‌Max. Operating Pressure‌: 3.4bar@25℃
- ‌Max. forward flow D.P.‌: 2.7bar@25℃
- ‌Effective filtration area‌: 800 cm²-3200 cm²

Product Parameters

Maximum inlet pressure:207 Bar@23℃
Maximum differential pressure:
Forward: 4 bar (60 psid) @ 23°C (73 °F)
反向: 0.07 MPa (0.7 bar, 10 psid) @ 23°C (73℉)
Maximum operating temperature:120 ℃ (248 ℉)
Gas flow rate:
Recommended working flow rate: 0-60slpm

Typical Applications

TFT LCD Manufacturing Process

Wafer Cleaning & Filtration

Semiconductor Filtration

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