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Photochemical Filter Polyflora B
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Polyflora B Series Photochemical Filter, based on the existing structure design of the E and F series, is developed to meet the high-precision demands and the stringent bubble control requirements of photoresist in critical points. It features a dual-channel exhaust system before and after the filter membrane, addressing filtration challenges in advanced photolithography technologies, and is suitable for the most critical photoresist and photochemical applications
Product Features
• Chemical Compatibility: Supports photochemical reagents such as EUV, ArF, KrF, etc.
• Low Leachables: Controls low leaching of metal ions, organic substances, and non-volatile residues.
• Ultra-Clean Process: Enhanced cleaning technology reduces particle shedding and micro-bubble formation.
• Flexible Adaptability: Multiple membrane materials (UPE, Nylon, PTFE) and retention accuracy options (3 nm to 200 nm) are available.
Typical Application
• EUV, ArF, KrF photoresist
• Developer
• Solvents
Technical Parameter
- Membrane: UPE、Nylon、PTFE
- Cage and End cap: HDPE
- Stand and water distribution layer: HDPE
- O-rings: FFKM
- Max. Operation Temperature: 40°C
- Max. Operating Pressure: 3.4bar@25℃
- Max. forward flow D.P.: 2.7bar@25℃
- Effective filtration area: 1200 cm²-3300 cm²
Product Parameters
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Maximum inlet pressure:207 Bar@23℃
Maximum differential pressure:
Forward: 4 bar (60 psid) @ 23°C (73 °F)
反向: 0.07 MPa (0.7 bar, 10 psid) @ 23°C (73℉)
Maximum operating temperature:120 ℃ (248 ℉)
Gas flow rate:
Recommended working flow rate: 0-60slpm
Typical Applications
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Contact
Hotline: (+86)400-820-6150
Email: marketing@feature-tec.com
Address: 8/F, Block A, Building 3, Tianhua Information Technology Park, 299 Longcao Road, Xuhui District, Shanghai