Semiconductor
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160L / 380L High Temperature Gas Diffuser
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The 160L and 380L diffusers are custom-engineered for large-format planar diffusion requirements and can be easily installed into vacuum systems. They are ideal for clean, fast, and turbulence-reduced backfill processes. Using these diffusers results in increased product yield and equipment throughput. When properly installed and operated under specified conditions, they can maintain product integrity for up to 3,000,000 cycles. Gasplate diffusers are widely used in semiconductor equipment interfaces (CVD, PVD, Etch, Epi) and in venting applications for load-lock chambers, transfer chambers, cooling chambers, and process chambers of other vacuum systems. They are designed for applications requiring the delivery of large gas flows in a short period of time.
Product Features
■ Reduces turbulence during process chamber venting
■ Compatible with various process gases
■ Manufactured, tested, and packaged in cleanroom environments
■ 100% integrity test passedTechnical Parameters
- Filter Material
316L Stainless Steel Powder Sintered - Housing
Low-Sulfur 316L - Max. Operating Differential Pressure
5 bar - Downstream Cleanliness
<1 particle/ft³
> 0.01 μm rated flow
- Working Life
≥100,000 cycles - Design Flow Rate
Per product specifications
- Filter Material
Product Parameters
Typical Applications
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Contact
Hotline: (+86)400-820-6150
Email: marketing@feature-tec.com
Address: 8/F, Block A, Building 3, Tianhua Information Technology Park, 299 Longcao Road, Xuhui District, Shanghai