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Press Release: Feature-Tec Unveils Breakthrough 2nm Filter at SEMICON China 2026​

2026-03-27

Shanghai, March 25, 2026​ – At SEMICON China 2026, Feature-Tec Advanced Materials​ unveiled its revolutionary 2nm modified PTFE membrane filter​ at Booth E6-6235, setting a new standard for semiconductor purity.

 

 

Industry-First 2nm Filtration Technology​

This domestically developed​ filter breakthrough:

✔ Cracks foreign tech barriers​

✔ Delivers unmatched nanoscale particle retention​

✔ Withstands extreme temperatures & corrosive chemicals

​

 

Why It Matters​

  • Solves critical material dependency challenges

  • Enables next-generation chip manufacturing

  • Showcased to global semiconductor leaders

 

 

 

 

About Feature-Tec​

A leader in ultra-high purity filtration​ for semiconductors and high-tech industries, with CNAS-certified R&D.

Contact:​ marketing@feature-tec.com | +86 400-820-6150

 

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Contact

Hotline: (+86)400-820-6150

Email: marketing@feature-tec.com

Address: 8/F, Block A, Building 3, Tianhua Information Technology Park, 299 Longcao Road, Xuhui District, Shanghai

©2024 Feature-tec (Shanghai) New Materials Co., Ltd.  

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