Papua New Guinea High Purity Gas Filter Cartridge FG10 / 15

Product Description

FG10/15 ultra-pure gas filter is specially designed for electronic-grade gas, and filtration accuracy can reach 1.5nm. GIST mini filter features a compact structure and high mechanical strength, demonstrating excellent compatibility with all categories of semiconductor process gases.

 

Product Features

  • 316L electronic grade hardware
  • High throughput and low pressure drop
  • Excellent chemical compatibility
  • Suitable for high temperature and high pressure environment
  • 100% integrity tested
  • 100% helium leak tested
  • Manufactured in a dust-free environment

 

Typical Application

  • PVD, CVD
  • Etching, Ion implantation and other process gas filtration

 

Technical Parameter

  • Membrance: PTFE
  • Cage and End cap: PFA
  • O-ring: FFKM
  • Shell: Solution I: Low sulfur SS316L; Solution II: SS 316L(VAR/VIM+VAR)
  • Surface Treatment: Outer surface: Ra<1.6μm; Inner surface: Ra<0.2μm
  • Filtration Rating: ≥1.5nm
  • Filtration Efficiency: ≥99.9999999%(9 LRV)@30 slpm
  • Helium Leak Test: Qualified: 2×10⁻¹⁰ atm·cc/sec; Tested: 1×10⁻⁹ atm·cc/sec
  • Max. inlet pressure: 207bar@23°C
  • Max. Forward D.P.: 4bar@23°C
  • Max. Reverse D.P.: 0.7bar@23°C
  • Max. operating Temp.: 120°C
  • Flow rate: 1.0~120 slpm, 1.5~300 slpm
  • Particle shedding: <1 particle/ft³@>0.1μm
  • Volatiles: <10 ppb moisture
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