PRODUCTS CENTER
Polyflora B Series Photochemical Filter, based on the existing structure design of the E and F series, is developed to meet the high-precision demands and the stringent bubble control requirements of photoresist in critical points. It features a dual-channel exhaust system before and after the filter membrane, addressing filtration challenges in advanced photolithography technologies, and is suitable for the most critical photoresist and photochemical applications
Polyflora E series photochemical filters feature a straight-type interface arrangement, while the F series features a triangular interface arrangement. Both types can be quickly assembled and disassembled with pipe fittings, suitable for deionized water, developer, photoresist, and other photochemical reagents, offering a wide range of applications.
The Feature Clean series is designed for the gas purification needs of POU end customers. The A series primarily aims to enhance the consistency and ultimate purity of high-purity inert gases used in the microelectronics industry. It employs a scientific material ratio to deeply remove impurities such as water, oxygen, carbon monoxide, and carbon dioxide from the inert gas, ensuring the gas purity at the final usage point.
The PTFE filtration solution is specially designed for advanced Wet Etch Cleaning (WEC) processes. It ensures excellent cleanliness while effectively removing particles from various acids, bases, and other process chemicals, featuring broad chemical compatibility and high throughput.
Contact
Hotline: (+86)400-820-6150
Email: marketing@feature-tec.com
Address: 8/F, Block A, Building 3, Tianhua Information Technology Park, 299 Longcao Road, Xuhui District, Shanghai